Publications
Below you can find the listing of officially published results of our 10ACe project. The titles of the publications along with the venues where they have been published provide a concise reference to the project’s validated outputs and dissemination activities.
peer reviewed article
OPC and modeling solution to support 0.55 NA EUV stitching
Journal of Micro/Nanopatterning, Materials, and Metrology, Issue 24 2025
SPIE-Intl Soc Optical Eng
10.1117/1.JMM.24.4.041203
peer reviewed article
Influence of water background pressure on removal rates of SiO2, Si and photo resist in reactive ion beam etching
Surfaces and Interfaces, Issue 64 2025
Elsevier BV
10.1016/J.SURFIN.2025.106306
conference proceeding
OPC and modeling solution to support 0.55NA EUV stitching
40th European Mask and Lithography Conference (EMLC 2025)
SPIE
10.1117/12.3063008
conference proceeding
OPC model accuracy of dry resist readiness for 0.55NA EUVL by using low-n bright field mask
International Conference on Extreme Ultraviolet Lithography 2024
SPIE
10.1117/12.3034957
conference proceeding
High-NA EUV single patterning of advanced metal logic nodes: inverse lithography techniques in combination with alternative mask absorbers
DTCO and Computational Patterning IV 2025
SPIE
10.1117/12.3051855
conference proceeding
Enablement of 0.55NA EUV bright field mask stitching
39th European Mask and Lithography Conference (EMLC 2024)
SPIE
10.1117/12.3031718
conference proceeding
High-NA stitching: model and OPC assessment for logic metal printing with a low-n mask
Optical and EUV Nanolithography XXXVIII 2025
SPIE
10.1117/12.3051285
conference proceeding
Analytical methods for SEM image enhancement: noise and charging effect reduction for precise contour extraction
International Conference on Extreme Ultraviolet Lithography 2025
SPIE
10.1117/12.3071948